Combined reactive magnetron sputtering and plasma decomposition of non-volatile precursors to grow luminescent thin films

This paper reports a new procedure of the preparation of mixed oxide thin films that combines the traditional reactive magnetron sputtering deposition with the plasma activated decomposition of non-volatile precursors sublimated by means of an effusion cell. The possibilities of this new experimental procedure are illustrated with the preparation of luminescent thin films consisting of…

Structure and tribological properties of MoCN-Ag coatings in the temperature range of 25–700 °C

The preparation of hard coatings with low friction coefficient over a wide temperature range is still a challenge for the tribological community. The development of new nanocomposite materials consisting of different metal-ceramic phases, each of which exhibiting self-lubricating characteristics at different temperatures, may help to solve this problem. We report on the structure and tribological…

Growth of SiO2 and TiO2 thin films deposited by reactive magnetron sputtering and PECVD by the incorporation of non-directional deposition fluxes

We have deposited TiO2 and SiO2 thin films by techniques as different as plasma-enhanced chemical vapor deposition (PECVD) and reactive magnetron sputtering under experimental conditions where highly directional deposition fluxes are avoided. The results indicate that whatever the deposition technique employed or even the precursor gas in the PECVD technique, films share common microstructural features:…