Microstructural characterization and thermal stability of He charged amorphous silicon films prepared by magnetron sputtering in helium
Sputtering of silicon in a Helium magnetron discharge has been reported as a bottom-up procedure to obtain amorphous Si films containing high amounts of gas-filled nanopores. Here we compare the microstructure and composition of Si-He nanocomposite films deposited by magnetron sputtering (MS) with 4He in DC or RF and 3He in RF operation modes. Electron…






