Comparative investigation of Al- and Cr-doped TiSiCN coatings

The aim of this work was a comparative investigation of the structure and properties of Al- and Cr-doped TiSiCN coatings deposited by magnetron sputtering of composite TiAlSiCN and TiCrSiCN targets produced by self-propagating high-temperature synthesis method. Based on X-ray diffraction, scanning and transmission electron microscopy, X-ray photoelectron spectroscopy, and Raman spectroscopy data, the Al- and…

Nitrogen plasma functionalization of low density polyethylene

Low density polyethylene (LDPE) films have been treated with different nitrogen containing plasmas with the purpose of incorporating nitrogen functional groups on its surface and analyzing the changes experienced in their surface tension. Effects of a dielectric barrier discharge (DBD) at atmospheric pressure and a microwave discharge (MW) at reduced pressure are compared with those…

Effect of process parameters on mechanical and tribological performance of pulsed-DC sputtered TiC/a-C:H nanocomposite films

Mechanical, structural, chemical bonding (sp(3)/sp(2)). and tribological properties of films deposited by pulsed-DC sputtering of Ti targets in Ar/C2H2 plasma were studied as a function of the substrate bias voltage, Ti-target current, C2H2 flow rate and pulse frequency by nanoindentation, Raman spectroscopy and ball-on-disc tribometry. The new findings in this study comprise: dense, column-free, smooth,…

Si-doped multifunctional bioactive nanostructured films

Si-doped multifunctional bioactive nanostructured films (MuBiNaFs) were deposited by DC magnetron sputtering of composite TiC0.5 + CaO + Si (A) and TiC0.5 + CaO + Si3N4 (B) targets produced by self-propagating high-temperature synthesis method. The films were characterized in terms of their structure, elemental and phase composition using X-ray diffraction, scanning and transmission electron microscopy,…

Comparative investigation of TiAlC(N), TiCrAlC(N), and CrAlC(N) coatings deposited by sputtering of МАХ-phase Ti2 − хCrхAlC targets

A comparative investigation of the structure and properties of TiAlC(N), TiCrAlC(N), and CrAlC(N) coatings deposited by sputtering of МАХ-phase Ti2 − хCrхAlC targets (where x = 0, 0.5, 1.5, and 2) in an Ar atmosphere or in a gaseous mixture of Ar + N2 is presented. The coatings were characterized in terms of their structure,…

High deposition rates of uniform films in tetramethylsilane-based plasmas generated by elementary microwave sources in matrix configuration

Plasma scaling up can be achieved by distributing elementary microwave plasma sources on planar rectangular networks. These so-called matrix plasmas can generate uniform sheets of plasma over a wide argon pressure range, from 7.5 to 750 Pa, with densities between 1012 and 1013 cm− 3. In order to estimate the capabilities of matrix plasmas for…