Rhodamine 6G (Rh6G) dye molecules have been incorporated into transparent and porous SiO2 thin films prepared by evaporation at glancing angles. The porosity of these films has been assessed by analyzing their water adsorption isotherms measured for the films deposited on a quartz crystal monitor. Composite Rh6G/SiO2 thin films were prepared by immersion of a…
A series of nanoindentation tests has been carried out with TiO2 films produced by physical vapour deposition (PVD) under different conditions. Films with different microstructures and crystallographic structures have been prepared by changing experimental parameters such as the temperature of the substrate, the deposition angle (by the so-called glancing angle physical vapour deposition, GAPVD) or…
N-doped TiO2 thin films have been prepared by plasma enhanced chemical vapor deposition and by physical vapor deposition by adding nitrogen or ammonia to the gas phase. Different sets of N-doped TiO2 thin films have been obtained by changing the preparation conditions during the deposition. The samples have been characterized by X-ray diffraction, Raman, UV−vis…
Mixed Zr–Si oxide thin films have been prepared at room temperature by ion beam decomposition of organometallic volatile precursors. The films were flat and amorphous. They did not present phase segregation of the pure single oxides. A significant amount of impurities (–C–, –CHx, –OH, and other radicals coming from partially decomposed precursors) remained incorporated in…
N-doped TiO2 thin films have been prepared by plasma enhanced chemical vapor deposition and by physical vapor deposition by adding nitrogen or ammonia to the gas phase. Different sets of N-doped TiO2 thin films have been obtained by changing the preparation conditions during the deposition. The samples have been characterized by X-ray diffraction, Raman, UV−vis…
TiO2 thin films in the form of anatase have been prepared by plasma enhanced chemical vapor deposition (PECVD) at 523 K as the substrate temperature and a low working pressure. The study of the microstructure and texture of the films at different stages of deposition show that their growth follows the Kolmogorov’s model developed to…
TiO2 thin films have been prepared by physical vapour deposition (PVD) and plasma enhanced chemical vapour deposition (PECVD) to study the UV-induced photo-activity of this material. Wetting angle variations and photo-catalytic activity for the degradation of dyes upon UV illumination have been compared for thin films with different crystalline structure (amorphous, rutile and anatase), microstructure…
TiO2 thin films have been prepared by physical vapour deposition (PVD) and plasma enhanced chemical vapour deposition (PECVD) to study the UV-induced photo-activity of this material. Wetting angle variations and photo-catalytic activity for the degradation of dyes upon UV illumination have been compared for thin films with different crystalline structure (amorphous, rutile and anatase), microstructure…
We have carried out a study of adsorption, on the (1 0 1) surface of anatase TiO2, of two industrially relevant rhodamine molecules [rhodamine 6G (R6G) and rhodamine 800 (R800)] employing molecular dynamics. These theoretical studies have shown that R6G must adsorb on surfaces under basic conditions. Moreover, the adsorption of this molecule shows a…
This work reports a procedure to modify the surface nanostructure of TiO2 anatase thin films through ion beam irradiation with energies in the keV range. Irradiation with N+ ions leads to the formation of a layer with voids at a depth similar to the ion-projected range. By setting the ion-projected range a few tens of…