Growth of SiO2 and TiO2 thin films deposited by reactive magnetron sputtering and PECVD by the incorporation of non-directional deposition fluxes

We have deposited TiO2 and SiO2 thin films by techniques as different as plasma-enhanced chemical vapor deposition (PECVD) and reactive magnetron sputtering under experimental conditions where highly directional deposition fluxes are avoided. The results indicate that whatever the deposition technique employed or even the precursor gas in the PECVD technique, films share common microstructural features:…

Competing Misfit Relaxation Mechanisms in Epitaxial Correlated Oxides

Strain engineering of functional properties in epitaxial thin films of strongly correlated oxides exhibiting octahedral-framework structures is hindered by the lack of adequate misfit relaxation models. Here we present unreported experimental evidence of a four-stage hierarchical development of octahedral-framework perturbations resulting from a progressive imbalance between electronic, elastic, and octahedral tilting energies in La0.7Sr0.3MnO3 epitaxial…