We have studied low refractive index fluorine doped silica thin films prepared by reactive magnetron sputtering. Two experimental parameters were varied to increase the porosity of the films, the geometry of the deposition process (i.e., the use of glancing angle deposition) and the presence of chemical etching agents (fluorine species) at the plasma discharge during…
This work reports the morphological and chemical modifications induced in TiO2 thin films by bombardment with high energy N+ ions at different temperatures and their different photo-activity responses after implantation under visible and UV light illumination. When implanted samples are illuminated with visible light, no dye photo-decolouration takes place despite that light transformed the surfaces…
The growth of ultra-smooth amorphous thin films induced by low-energy (below 1 keV) ion-assistance processes is studied. The relative contribution of ion-induced smoothening effects is analysed by means of a Monte Carlo model and experimental data. In general, highly rough granular or ultra-smooth (with roughness below one monolayer) films are produced depending on the competition…
Porous Bragg microcavities formed by stacking a series of porous nanocolumnar layers with alternate low (SiO2) and high (TiO2) refractive index materials have been prepared by physical vapor deposition at glancing angles (GLAD). By strictly controlling the porosity and refractive index of the individual films, as well as the relative orientation of the nanocolumns from…
Highly oriented CrO2 thin films have been heteroepitaxially grown on TiO2 rutile (110), (100) and (001) single crystalline substrates, by Low Pressure Chemical Vapor Deposition from CrO3 as precursor and flowing oxygen as carrier gas, under a pressure of 67 Pa. The experimental conditions were fine tuned by depositing on polycrystalline Ti foils, to improve the…
A new approach is presented to produce amorphous porous silicon coatings (a-pSi) with closed porosity by magnetron sputtering of a silicon target. It is shown how the use of He as the process gas at moderated power (50–150 W RF) promotes the formation of closed nanometric pores during the growth of the silicon films. The…
This paper reports a new procedure of the preparation of mixed oxide thin films that combines the traditional reactive magnetron sputtering deposition with the plasma activated decomposition of non-volatile precursors sublimated by means of an effusion cell. The possibilities of this new experimental procedure are illustrated with the preparation of luminescent thin films consisting of…
The preparation of hard coatings with low friction coefficient over a wide temperature range is still a challenge for the tribological community. The development of new nanocomposite materials consisting of different metal-ceramic phases, each of which exhibiting self-lubricating characteristics at different temperatures, may help to solve this problem. We report on the structure and tribological…
