Optical properties of Zr and ZrO2 films deposited by laser ablation

Optical properties of Zr and ZrO2 films in the energy range from 1.5 to 100eV were obtained by quantitative analysis of reflection electron energy loss spectroscopy (REELS) and ellipsometry. The films were prepared oil (I 1 1) silicon substrates by reactive laser ablation using a zirconium target. For the growth of ZrO2 films a pressure of 5 m Torr of oxygen in the growth chamber was used. The substrate temperature during deposition was 400 degrees C. The deposits were Studied ex…