{"id":29220,"date":"2009-08-31T23:44:49","date_gmt":"2009-08-31T21:44:49","guid":{"rendered":"https:\/\/icmsva.vallealto.es\/?articulos_sci=formation-of-nitrogen-functional-groups-on-plasma-treated-dlc"},"modified":"2026-04-14T11:50:33","modified_gmt":"2026-04-14T09:50:33","slug":"formation-of-nitrogen-functional-groups-on-plasma-treated-dlc","status":"publish","type":"articulos_sci","link":"https:\/\/icmsva.vallealto.es\/?articulos_sci=formation-of-nitrogen-functional-groups-on-plasma-treated-dlc","title":{"rendered":"Formation of Nitrogen Functional Groups on Plasma Treated DLC"},"content":{"rendered":"<figure><img decoding=\"async\" src=\"https:\/\/icmsva.vallealto.es\/wp-content\/uploads\/2009\/08\/Formation-of-Nitrogen-Functional-Groups-on-Plasma-1.png\" alt=\"Formation of Nitrogen Functional Groups on Plasma Treated DLC\" \/><\/figure>\n<p>Diamond like carbon (DLC) thin films have been exposed to different nitrogen containing plasmas. A dielectric barrier discharge (DBD) at atmospheric pressure and a microwave discharge (MW) at low pressure using N2 and mixtures Ar\u2009+\u2009NH3 have been compared. Optical Emission and X-ray Photoelectron spectroscopies, Atomic Force Microscopy and contact angle measurements have been used for this study. A DBD with Ar\u2009+\u2009NH3 is the most efficient method for DLC functionalization. Films treated with this plasma presented the highest concentration of amine groups as determined by derivatization with 4-chlorobenzaldehyde. All the treated samples underwent a significant aging with time. The efficiency of the different plasmas for DLC functionalization is discussed in the light of the intermediate species detected in the plasma.<\/p>\n","protected":false},"excerpt":{"rendered":"<p>Diamond like carbon (DLC) thin films have been exposed to different nitrogen containing plasmas. A dielectric barrier discharge (DBD) at atmospheric pressure and a microwave discharge (MW) at low pressure using N2 and mixtures Ar\u2009+\u2009NH3 have been compared. Optical Emission and X-ray Photoelectron spectroscopies, Atomic Force Microscopy and contact angle measurements have been used for&hellip;<\/p>\n","protected":false},"featured_media":29223,"template":"","autores":[],"grupos_de_investigacion":[142],"revistas":[1176],"anos":[896],"class_list":["post-29220","articulos_sci","type-articulos_sci","status-publish","has-post-thumbnail","hentry","grupos_de_investigacion-nanotecnologia-en-superficies-y-plasma","revistas-plasma-processes-and-polymers","anos-896","description-off"],"acf":[],"_links":{"self":[{"href":"https:\/\/icmsva.vallealto.es\/index.php?rest_route=\/wp\/v2\/articulos_sci\/29220","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/icmsva.vallealto.es\/index.php?rest_route=\/wp\/v2\/articulos_sci"}],"about":[{"href":"https:\/\/icmsva.vallealto.es\/index.php?rest_route=\/wp\/v2\/types\/articulos_sci"}],"version-history":[{"count":1,"href":"https:\/\/icmsva.vallealto.es\/index.php?rest_route=\/wp\/v2\/articulos_sci\/29220\/revisions"}],"predecessor-version":[{"id":29226,"href":"https:\/\/icmsva.vallealto.es\/index.php?rest_route=\/wp\/v2\/articulos_sci\/29220\/revisions\/29226"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/icmsva.vallealto.es\/index.php?rest_route=\/wp\/v2\/media\/29223"}],"wp:attachment":[{"href":"https:\/\/icmsva.vallealto.es\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=29220"}],"wp:term":[{"taxonomy":"autores","embeddable":true,"href":"https:\/\/icmsva.vallealto.es\/index.php?rest_route=%2Fwp%2Fv2%2Fautores&post=29220"},{"taxonomy":"grupos_de_investigacion","embeddable":true,"href":"https:\/\/icmsva.vallealto.es\/index.php?rest_route=%2Fwp%2Fv2%2Fgrupos_de_investigacion&post=29220"},{"taxonomy":"revistas","embeddable":true,"href":"https:\/\/icmsva.vallealto.es\/index.php?rest_route=%2Fwp%2Fv2%2Frevistas&post=29220"},{"taxonomy":"anos","embeddable":true,"href":"https:\/\/icmsva.vallealto.es\/index.php?rest_route=%2Fwp%2Fv2%2Fanos&post=29220"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}