A 4-view imaging to reveal microstructural differences in obliquely sputter-deposited tungsten films

Materials Letters, 264 (2020) 127381

A 4-view imaging to reveal microstructural differences in obliquely sputter-deposited tungsten films

We report on the morphological disparity of the columnar growth in W thin films sputter-deposited by oblique angle deposition. Oriented tungsten thin films (400 +/- 50 nm thick) are prepared using a tilt angle alpha of 80 degrees and a sputtering pressure of 0.25 Pa. Inclined columns (beta = 38 +/- 2 degrees) are produced and the microstructure is observed by scanning electron microscopy. A 4-view imaging is performed in order to show inhomogeneous growing evolutions in the columns. Morphological features vs. viewing direction are also investigated from a growth simulation of these tilted W columns. Experimental and theoretical approaches are successfully compared and allow understanding how the direction of the W particle flux leads to dense or fibrous morphologies, as the column apexes are in front of the flux or in the shadowing zone. 

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