Magnetron sputtering (MS) is an emerging technique to prepare electrocatalysts for oxygen and hydrogen evolution reactions that take place in alkaline water electrolysis. It is a physical vapour deposition method that provides a strict control over the composition, chemical state, and microstructure. It permits to adjust complex stoichiometries and guarantees reproducibility. This technology allows to deposit electrocatalysts on suitable current collectors to get anode and cathode electrodes in a one-step process. Furthermore, MS is an environment friendly technology with easy scalability for industrial electrode production. Additionally, when operated in an oblique angle deposition configuration, it allows precise control of the microstructure of the deposits that can be tuned from compact to mesoporous. On this brief review we discuss recent studies on the field showing the possibility of using MS for the preparation of catalyst layers with complex compositions, bi-layer structure configurations, and bimetallic, trimetallic, and multicomponent alloys.